AVS 59th Annual International Symposium and Exhibition | |
Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | PS2-MoA1 Invited Paper Tailored Ion Energy Distributions on Plasma Electrodes P. Diomede, D.J. Economou, V.M. Donnelly, University of Houston |
2:40pm | PS2-MoA3 Self-Consistent Multi-Dimensional Modeling of Inductively Coupled Plasmas A. Agarwal, J. Kenney, M.-F. Wu, S. Rauf, K. Collins, Applied Materials Inc. |
3:00pm | PS2-MoA4 Feature Profile Modeling of STT-MRAM Etch P. Stout, Applied Materials Inc. |
3:40pm | PS2-MoA6 Development of a New Industry Focused Plasma Simulation Tool A.I. Williams, University College London, UK, S. Lopez-Lopez, Quantemol Ltd., UK, W. Brigg, J. Tennyson, University College London, UK |
4:00pm | PS2-MoA7 Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori, Nagoya University, Japan |
4:40pm | PS2-MoA9 Excitation of Ion Acoustic Waves by Electron Beams I.D. Kaganovich, Princeton Plasma Physics Laboratory, D. Sydorenko, University of Alberta, Canada, E. Tokluoglu, E.A. Startsev, A.V. Khrabrov, Princeton Plasma Physics Laboratory, L. Chen, P. Ventzek, R. Sundararajan, Tokyo Electron America |
5:00pm | PS2-MoA10 Multi-Peaked and Stepped Electron Velocity Distributions in RF-DC Discharges with Secondary Emission A.V. Khrabrov, I.D. Kaganovich, Princeton Plasma Physics Laboratory, D. Sydorenko, University of Alberta, Canada, E. Tokluoglu, E.A. Startsev, Princeton Plasma Physics Laboratory, L. Chen, P. Ventzek, R. Sundararajan, Tokyo Electron America |
5:20pm | PS2-MoA11 Simulations of the Radial Line Slot Antenna Plasma Source P. Ventzek, Tokyo Electron America, S. Mahadevan, Esgee Technologies, J. Yoshikawa, Tokyo Electron Technology Development Institute, INC., L. Raja, University of Texas at Austin, T. Iwao, Tokyo Electron Technology Development Institute, INC., L. Chen, R. Sundararajan, J. Zhao, Tokyo Electron America, T. Nozawa, K. Ishibashi, Tokyo Electron Technology Development Institute, INC., R. Upadhyay, Esgee Technologies |