AVS 59th Annual International Symposium and Exhibition
    Plasma Science and Technology Monday Sessions
       Session PS2-MoA

Paper PS2-MoA11
Simulations of the Radial Line Slot Antenna Plasma Source

Monday, October 29, 2012, 5:20 pm, Room 25

Session: Plasma Modeling
Presenter: P. Ventzek, Tokyo Electron America
Authors: P. Ventzek, Tokyo Electron America
S. Mahadevan, Esgee Technologies
J. Yoshikawa, Tokyo Electron Technology Development Institute, INC.
L. Raja, University of Texas at Austin
T. Iwao, Tokyo Electron Technology Development Institute, INC.
L. Chen, Tokyo Electron America
R. Sundararajan, Tokyo Electron America
J. Zhao, Tokyo Electron America
T. Nozawa, Tokyo Electron Technology Development Institute, INC.
K. Ishibashi, Tokyo Electron Technology Development Institute, INC.
R. Upadhyay, Esgee Technologies
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The Radial Line Slot Antenna plasma source couples microwave power through a slot antenna structure and window to a plasma characterized by a generation zone adjacent to the window and a diffusion zone that contacts a substrate. The diffusion zone is characterized by a very low electron temperature. This property renders the source useful for soft etch applications and thin film processing for which low ion energy is desirable. The coupling between the microwave applicator, slot antenna, coupling window and plasma is complex and the subject of many investigations more often than not electromagnetic wave analysis. Another way to look at the coupling is that of a microwave network ending in a plasma load. A systematic analysis of the interrelationship between slot geometry, position and basic coupling window characteristics is presented revealing the complex impedance relationship between critical elements. We will begin presenting results from 2 dimensional plasma simulations illustrating sensitivity of the coupling to slot location using a single slot then go on to more complex examples. The plasma load itself adds additional challenges. In particular the importance of the high frequency behavior of the electron energy distribution function on the plasma load will be presented. Ignoring the impact of the driving frequency on the electron energy distribution function leads to significant variation in plasma predicted densities.