| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS1-TuM1 Invited Paper Monitoring Plasma Etch Processes with Wave Cut-Off, Langmuir, and Radio-Frequency Probes M.A. Sobolewski, National Institute of Standards and Technology (NIST) |
| 8:40am | PS1-TuM3 Impact of Self-Absorption on Emission Spectral Lines for Non-Equilibrium Plasma Source E. Gudimenko, V. Milosavljevic, S. Daniels, Dublin City University, Ireland |
| 9:00am | PS1-TuM4 Real-Time Plasma Deposition Thickness Control using In Situ Optical Emission Interferometry D.J. Johnson, K.D. Mackenzie, C.W. Johnson, L. Martinez, Plasma-Therm LLC |
| 9:20am | PS1-TuM5 Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes T. Suzuki, A. Malinowski, K. Takeda, H. Kondo, K. Ishikawa, Nagoya University, Japan, Y. Setsuhara, Osaka University, Japan, M. Shiratani, Kyushu University, Japan, M. Sekine, M. Hori, Nagoya University, Japan |
| 10:40am | PS1-TuM9 Experimental Implementation of Real-time Multivariable Control of a Capacitively Coupled Plasma Y. Zhang, B.J. Keville, C. Gaman, A. Holohan, M. Turner, S. Daniels, Dublin City University, Ireland |
| 11:00am | PS1-TuM10 Multivariable Control of a Capacitively Coupled Plasma B.J. Keville, Y. Zhang, M. Turner, Dublin City University, Ireland |
| 11:20am | PS1-TuM11 Single and Multi-Point Ion Energy Distributions in a VHF+RF Commercial Reactor Measured by Novel In-Wafer Ion Energy Analyzer B.G. Lane, M. Funk, L. Chen, R. Sundararajan, J. Zhao, Tokyo Electron America |
| 11:40am | PS1-TuM12 Characterizing Electron Beam Generated Plasmas for Plasma Processing Applications D.R. Boris, R. Fernsler, S.G. Walton, Naval Research Laboratory |