| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-ThA1 Invited Paper Study on Microwave ECR Plasma Source for 450-mm Wafer Etching K. Maeda, Hitachi, Ltd., Japan, H. Tamura, S. Obama, M. Izawa, Hitachi High-Technologies Corp., Japan, G. Miya, Hitachi, Ltd., Japan |
| 2:40pm | PS-ThA3 A Grid Reactor with Low Ion Energy Bombardment for Large Area PECVD of Thin Film Silicon Solar Cells M. Chesaux, A.A. Howling, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland, U. Kroll, D. Dominé, Oerlikon Solar-Lab SA, Switzerland, Ch. Hollenstein, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland |
| 3:00pm | PS-ThA4 Plasma Generation and Delivery from a VHF Remote Source D. Carter, D. Hoffman, K. Peterson, R. Grilley, Advanced Energy Industries Inc. |
| 3:40pm | PS-ThA6 Mechanical Optimization of a Plasma Source Device S. Polak, M. Thornton, D. Hoffman, D. Carter, Advanced Energy Industries Inc. |
| 4:20pm | PS-ThA8 Impact of Reactor Design on Plasma Polymerization Processes - An International Round-Robin Study J.D. Whittle, A. Michelmore, D.A. Steele, R.D. Short, University of South Australia |
| 4:40pm | PS-ThA9 A Mini Plasma Source for In Situ Sample Cleaning N.B. Koster, F.T. Molkenboer, R.J. Bolt, T.J. Versloot, J.P.B. Janssen, TNO Technical Sciences, The Netherlands |
| 5:00pm | PS-ThA10 Magnetic Neutral Loop Discharge Reactor for Low-k Dielectric Plasma Processing W.Y. Li, Z. Ling, H.-Z. Zhang, J.A. Bray, T.M. Griffin, M.T. Nichols, University of Wisconsin-Madison, B.N. Moon, Y.M. Sung, Kyungsung University, Korea, S. Banna, Applied Materials, Inc., Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
| 5:20pm | PS-ThA11 High Efficiency ICP Source for Plasma Dry Clean Processing V. Nagorny, O. Todor, V. Surla, A. Kadavanich, Mattson Technology, Inc. |