AVS 59th Annual International Symposium and Exhibition | |
Nanometer-scale Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | NS+SP-MoA1 Optical Properties of As-Prepared and Annealed Gold Nanostructures Fabricated by Interference Lithography A.B. Tsargorodska, University of Sheffield, UK, A.V. Nabok, Sheffield Hallam University, UK, A.J. Lee, University of Leeds, UK, G.J. Legget, University of Sheffield, UK |
2:20pm | NS+SP-MoA2 Invited Paper Fast Turnaround 3D Nanolithography using Heated Probes – from Nanofabrication to Directed Assembly A.W. Knoll, P. Paul, IBM Research - Zurich, Switzerland, F. Holzner, IBM Research - Zurich, ETH Zurich, Switzerland, J.L. Hedrick, IBM Research - Almaden, M. Despont, IBM Research - Zurich, Switzerland, C. Kuemin, IBM Research - Zurich, ETH Zurich, Switzerland, H. Wolf, IBM Research - Zurich, Switzerland, N.D. Spencer, ETH Zurich, Switzerland, U. Duerig, IBM Research - Zurich, Switzerland |
3:00pm | NS+SP-MoA4 Laser Assisted Electron Beam Induced Deposition of Platinum N.A. Roberts, University of Tennessee Knoxville, J.D. Fowlkes, Oak Ridge National Laboratory, G.A. Magel, T.M. Moore, Omniprobe, Inc. an Oxford Instruments Company, P.D. Rack, University of Tennessee Knoxville |
3:40pm | NS+SP-MoA6 Parallel Stacking of Extended π-conjugated Molecules on Si(100)-H Surface M.Z. Hossain, Gunma University, Japan, H. Kato, Osaka University, Japan, M. Kawai, The University of Tokyo and RIKEN, Japan |
4:00pm | NS+SP-MoA7 Kinetics of disilane reaction on Si(100)-(2x1): Flux, Temperature, and H-coverage Dependence D. Dick, J.-F. Veyan, University of Texas at Dallas, P. Mathieu, Mc Gill University, Canada, J.N. Randall, Zyvex Laboratories, Y.J. Chabal, University of Texas at Dallas |
4:20pm | NS+SP-MoA8 SPM Lithography on Silicon Reconstructed and Hydrogen-Passivated Surface J. Fu, K. Li, N. Pradeep, L. Chen, R. Silver, National Institute of Standards and Technology |
4:40pm | NS+SP-MoA9 Ultra-High Frequency Surface Acoustic Wave Generation in Silicon Using Inverted Nanoimprint Lithography S. Büyükköse, University of Twente, Netherlands, B. Vratzov, NT&D – Nanotechnology and Devices, Germany, D. Ataç, J. van der Veen, University of Twente, Netherlands, P.V. Santos, Paul-Drude-Institut für Festkörperelektronik, Germany, W.G. van der Wiel, University of Twente, Netherlands |
5:00pm | NS+SP-MoA10 Variance of Proximity Effect Correction Parameter Measured on Silicon D.A. Czaplewski, L.E. Ocola, Argonne National Laboratory |
5:20pm | NS+SP-MoA11 Nanopatterning of Poly(N-isopropylacrylamide) based Hydrogel – Gold Nanoparticle Composite K.J. Suthar, D.C. Mancini, R.S. Divan, Argonne National Laboratory, O.N. Ahanotu, University of Michigan |