| 8:20am |
NM+AS+MS-MoM1 Invited Paper
Nanomanufacturing – Beyond Silicon
J.A. Liddle, National Institute of Standards and Technology |
| 9:00am |
NM+AS+MS-MoM3
Use of Mueller Matrix – Spectroscopic Ellipsometry for Scatterometry based Measurement of Critical Dimensions during Semiconductor Manufacturing
G.R. Muthinti, A.C. Diebold, University at Albany-SUNY, B. Peterson, Nanometrics Inc. |
| 9:20am |
NM+AS+MS-MoM4
Atomic Layer Deposition Monitored and Characterized by Joint In Situ Real-Time Spectroscopic Ellipsometry and Direct Surface Analysis
M. Junige, M. Geidel, M. Knaut, M. Albert, J.W. Bartha, Technische Universität Dresden, Germany |
| 10:40am |
NM+AS+MS-MoM8 Invited Paper
Transformation of Engineered Nanomaterials in the Environment: Effects of Size, Shape and Morphology on Nanomaterial Toxicity
S. Obare, Western Michigan University |
| 11:20am |
NM+AS+MS-MoM10 Invited Paper
An Integrated Approach Toward Understanding the Environmental Fate, Transport, Toxicity and Occupational Health Hazards of Nanomaterials
V. Grassian, University of Iowa |