AVS 59th Annual International Symposium and Exhibition
    Electronic Materials and Processing Friday Sessions

Session EM+NS-FrM
Low-Resistance Contacts to Nanoelectronics

Friday, November 2, 2012, 8:20 am, Room 14
Moderator: S. Zollner, New Mexico State University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am EM+NS-FrM1 Invited Paper
Electrical Transport on Chemically Modified Silicon-on-Insulator Substrates
G.P. Lopinski, National Research Council of Canada
9:00am EM+NS-FrM3
Evidence for Single Electron Tunnel Junction using Gold Nanoparticles on Oxide-Free Si(111)
L. Caillard, O. Seitz, P. Campbell, University of Texas at Dallas, O. Pluchery, Université Pierre et Marie Curie, France, Y.J. Chabal, University of Texas at Dallas
9:20am EM+NS-FrM4
A Distribution of Variable Size Sn-islands on 0.8 nm Oxide/ Si (111): Local MOS Properties and Tunneling Studied with Synchrotron Radiation
A. Silva, Universidade Nova de Lisboa, Portugal, K. Pedersen, Aalborg University, Denmark, Z.S. Li, Aarhus University, Denmark, P. Morgen, University of Southern Denmark
9:40am EM+NS-FrM5
Signatures of Interface Band Structure and Parallel Momentum Conservation of Hot Electrons across Metal-Semiconductor Schottky Diodes
J. Garramone, Northwestern University, J. Abel, R. Balsano, University at Albany-SUNY, S. Barraza-Lopez, University of Arkansas at Fayetteville, V.P. LaBella, University at Albany-SUNY
10:00am EM+NS-FrM6
Metal-Fullerene Interfaces: A Dynamic System
P. Reinke, J.B. McClimon, H. Sahalov, University of Virginia
10:20am EM+NS-FrM7 Invited Paper
Scaling Silicide Contacts in Microlelectronics: At What Size will Material Characteristics affect Device Poperties ?
C. Lavoie, IBM T.J. Watson Research Center
11:00am EM+NS-FrM9
Compositional Dependence of the Dielectric Function and Optical Conductivity of NiPt Alloy Thin Films
L.S. Abdallah, T. Tawalbeh, I.V. Vasiliev, S. Zollner, New Mexico State University, C. Lavoie, IBM T.J. Watson Research Center, A. Ozcan, IBM Systems and Technology Group, M. Raymond, GLOBALFOUNDRIES
11:20am EM+NS-FrM10
Ultra-Shallow Junction Formation for sub-22nm CMOS Technology and Characterization using High-resolution SIMS
M.J.P. Hopstaken, H. Wildman, D. Pfeiffer, IBM T.J. Watson Research Center, Z. Zhu, P. Ronsheim, IBM Systems and Technology Group, K.K. Chan, I. Lauer, J.S. Newbury, D.-G. Park, IBM T.J. Watson Research Center
11:40am EM+NS-FrM11
A Deep Dive into the Liquid Fermi Sea
R.K. Schulze, J.C. Lashley, B. Mihaila, D.C. Wallace, Los Alamos National Laboratory