| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS-ThM1 Comparison of Primary Ion Beams for XPS Sputter Depth Profiling of Organic Samples S.J. Hutton, C.J. Blomfield, S.J. Page, W. Boxford, Kratos Analytical Ltd., UK |
| 8:20am | AS-ThM2 Invited Paper Molecular SIMS - Revolutionized by Cluster Primary Ion Beams? J.C. Vickerman, The University of Manchester, UK |
| 9:00am | AS-ThM4 New Organic Reference Materials for Cluster Ion Sputter Depth Profiling A.G. Shard, S. Spencer, S. Smith, I.S. Gilmore, R. Havelund, National Physical Laboratory, UK |
| 9:20am | AS-ThM5 Characterization of Nano-objects with Nanoprojectile-Secondary Ion Mass Spectrometry C.-K. Liang, J.D. DeBord, M. Eller, S. Verkhoturov, E. Schweikert, Texas A&M University |
| 9:40am | AS-ThM6 Organic Solar Cell Composition Profiling by Large Clusters Ions: How can we Optimize the Information Retrieved? T. Conard, A. Franquet, E. Voroshazi, D. Cheyns, P. Favia, W. Vandervorst, IMEC, Belgium |
| 10:40am | AS-ThM9 Molecular Imaging of Cells and Tissues with Ar Cluster Ion Beams J. Matsuo, S. Nakagawa, M. Py, T. Aoki, T. Seki, Kyoto University, Japan |
| 11:00am | AS-ThM10 Observation of High Ionization Probability for Desorption/Ionization Induced by Neutral Cluster Impact and its Application in Bioanalytics B.-J. Lee, M. Baur, University of Applied Sciences Esslingen, Germany, C.R. Gebhardt, Bruker Daltonik GmbH, Germany, M. Dürr, University of Applied Sciences Esslingen, Germany |
| 11:20am | AS-ThM11 Analysis of Molecular Surfaces Using a Pulsed Beam of Large Argon Clusters N. Havercroft, ION-TOF USA, Inc., D. Rading, S. Kayser, R. Moellers, F. Kollmer, E. Niehuis, ION-TOF GmbH, Germany |
| 11:40am | AS-ThM12 Electrospray Droplet Impact/SIMS: Some Insights into the Collisional Events K. Hiraoka, Y. Sakai, S. Ninomiya, R. Takaishi, University of Yamanashi, Japan |