| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Thursday Sessions |
| Session AS-ThM |
| Session: | Applications of Large Cluster Ion Beams |
| Presenter: | S.J. Hutton, Kratos Analytical Ltd., UK |
| Authors: | S.J. Hutton, Kratos Analytical Ltd., UK C.J. Blomfield, Kratos Analytical Ltd., UK S.J. Page, Kratos Analytical Ltd., UK W. Boxford, Kratos Analytical Ltd., UK |
| Correspondent: | Click to Email |
Several types of cluster ion sources are available aimed at facilitating X-ray Photoelectron Spectroscopy (XPS) sputter depth profiling of organic materials. These ion sources may be categorised as either carbon based sources (e.g. Coronene) or Ar cluster ion sources. Both types of source may be fitted to modern XPS instruments. Experimental parameters such as primary ion voltage, primary ion incidence angle and cluster size may be optimised to improve profiling results. The sample environment may also be controlled to extend the range of polymers which are amenable to sputter profiling. Sample parameters which have been shown to be important include rotation with respect to the ion beam and sample temperature.
In this study we compare the performance of Carbon and Ar based cluster ion sources on a range of organic thin films, from fields as diverse as organic PV materials, OLED’s, cross-linked plasma polymers and multilayers. Samples were analysed under a range of sample conditions with both sources. Direct comparison allows the efficacy of ion beams to be rated for a range of sample types.