| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Wednesday Sessions |
| Session AS-WeM |
| Session: | Surface Analysis of Biological Materials Using Vibrational & Non Linear Optical Spectroscopy Techniques (8:00-10:00 am) / 3D Imaging & Nanochemical Analysis - Part 1 (10:40 am-12:00 pm) |
| Presenter: | F. Kollmer, ION-TOF GmbH, Germany |
| Authors: | F. Kollmer, ION-TOF GmbH, Germany S. Kayser, ION-TOF GmbH, Germany N. Havercroft, ION-TOF USA, Inc. D. Rading, ION-TOF GmbH, Germany R. Moellers, ION-TOF GmbH, Germany W. Paul, ION-TOF GmbH, Germany E. Niehuis, ION-TOF GmbH, Germany |
| Correspondent: | Click to Email |
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces and full three-dimensional analysis of a sample. A major improvement especially for the analysis of molecular surfaces on a small scale has been the introduction of cluster ion beams that increases the sensitivity by orders of magnitude [1].
In recent years Bi clusters have become a standard primary ion species for all TOF-SIMS imaging applications providing a lateral resolution of down to 80 nm. Recent developments allow pushing the performance further towards the physical limits of the technique. Under optimized conditions we will present a lateral resolution of less than 20 nm by applying Bi3 clusters on a certified reference material [2] and real world samples.
Usually for TOF-SIMS depth profiling and 3D-analysis, a dual beam approach is accomplished with dedicated analysis and sputter beams. However, the analysis of structures at greater depth (> 10 µm) needs long sputter times and the build-up of surface roughness at the crater bottom limits the achievable spatial resolution. In order to overcome these limitations we used a combined SIMS/FIB setup for the analysis of inorganic samples. Hereby, the Bi cluster beam is used to FIB mill a crater into a sample and the vertical crater wall is subsequently analysed by TOF-SIMS. We will present 2D and 3D data of reference samples, as well as, real world samples analysed by this approach.
The challenge of three dimensional analysis of molecular surfaces is to maintain the molecular structure of the exposed surface while removing the covering material. In this respect the development of new sputter ion sources using massive Ar clusters allows the preservation of molecular information under high dose sputtering [3]. This has enabled TOF-SIMS to do depth profiling and 3D analysis of organic materials. In our contribution we will present 3D analysis of an OLED display device using an Ar gas cluster ion beam for sputtering in combination with a Bi cluster beam for analysis.
[1] F. Kollmer, Appl. Surf. Sci. 231-232, 2004, 153–158
[2] M. Senoner, W. E. S. Unger, Surf. Interface Anal. 39, 2007, 16-25
[3] S. Ninomiya, K. Ichiki, H. Yamada, Y. Nakata, T. Seki, T. Aoki, J. Matsuo, Rapid Communications in Mass Spectrometry 2009, 23, 1601-1606