AVS 59th Annual International Symposium and Exhibition
    Applied Surface Science Tuesday Sessions
       Session AS-TuP

Paper AS-TuP13
XPS Sputter Depth Profiling of Organic Thin Films Using an Ar Cluster Ion Source

Tuesday, October 30, 2012, 6:00 pm, Room Central Hall

Session: Applied Surface Science Poster Session
Presenter: A.J. Roberts, Kratos Analytical Ltd., UK
Authors: A.J. Roberts, Kratos Analytical Ltd., UK
S.J. Hutton, Kratos Analytical Ltd., UK
C.J. Blomfield, Kratos Analytical Ltd., UK
W. Boxford, Kratos Analytical Ltd., UK
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A new 20 keV Ar cluster ion source has been used to successfully sputter profile through a range of organic thin films and multilayers. Samples were analysed using XPS between sputter cycles to allow the chemical composition of the sample to be probed as a function of depth into the material. Use of massive Ar cluster ions (1000 to 2000 Ar atoms per ion) promote the retention of sample chemistry throughout the depth profile.In this study we report the performance of the Ar cluster ion source on a range of organic thin films, from fields as diverse as organic PV materials, OLED’s, cross-linked plasma polymers and multilayers. Analysis conditions were optimised to maximise retention of chemical functionalities and minimise ion induced interlayer broadening.