AVS 59th Annual International Symposium and Exhibition
    Applied Surface Science Thursday Sessions
       Session AS-ThA

Paper AS-ThA1
Applications of a C60 Ion Source for Surface Chemical Analysis: It’s Not Just for Polymers

Thursday, November 1, 2012, 2:00 pm, Room 20

Session: Applications of Large Cluster Ion Beams - Part 2 (2:00-3:20 pm)/ Surface Analysis using Synchrotron Techniques (3:40-5:40 pm)
Presenter: W.F. Stickle, HP
Authors: W.F. Stickle, HP
M.D. Johnson, HP
D. Bilich, HP
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While C60+ ion sources are becoming one of the routinely used tools in the surface chemical analysis laboratory its primary value has been for the study of organic systems. Commonly used for ToF SIMS, the C60+ ion source is also a standard option for photoelectron spectroscopy tools. But many surface analysis laboratories study a wide variety of materials, not just organic thin films, which raises the question as to using this novel ion source for ‘routine’ analyses. Being able to use of this ion source in a ‘routine’ fashion requires characterization and understanding of the surface that is being created during the ion milling process. It is important to understand the sputter induced chemistry that may be created by the C60+ source as well as understanding the physical changes that occur to a sample surface during the ion milling. The effects of preferential sputtering, chemical changes or reactions and the nature of surface roughening than can occur will be presented. Several different material systems are examined and discussed with regard to using a C60+ ion gun for enhancing and clarifying ‘routine’ analyses. The different types of samples to be discussed will include inorganic oxides, multilayer structures as well as metal-metal oxide layered structures and polymers.