AVS 59th Annual International Symposium and Exhibition
    Applied Surface Science Monday Sessions
       Session AS-MoM

Paper AS-MoM5
Simplified Extrinsic Background for XPS Data Fitting

Monday, October 29, 2012, 9:40 am, Room 20

Session: Quantitative Surface Chemical Analysis, Technique Development, and Data Interpretation - Part 1
Presenter: A. Herrera-Gomez, UAM-Azcapotzalco and CINVESTAV-Queretaro, Mexico
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In this presentation it is described a simplified form of the background for extrinsic scattering in the near-peak regime for X-Ray Photoelectron Spectroscopy (XPS) data peak-fitting. It directly accounts for the change on the slope of the background between the two sides of the core-level peak. With an approach similar to the employed for the Shirley background, it is proposed that the change on the background slope at energy E is proportional to the integrated signal above E. This functional form can be reproduced by assuming that the inelastic cross section is proportional to the energy loss. As for the Shirley background, and in contrast to the currently employed extrinsic background models, the background here introduced only employs one parameter. It has some extra advantages for XPS data peak fitting, such that its functional form is the same regardless of the core level, it account for the finiteness of the peak width in the generation of the background signal, it can be employed simultaneously with the intrinsic Shirley background, and last, but not least, it provides for good fits. Some implementations of the method are discussed.