| AVS 59th Annual International Symposium and Exhibition | |
| Applied Surface Science | Tuesday Sessions |
| Session AS+BI-TuM |
| Session: | Practical Surface Analysis |
| Presenter: | H. Piao, General Electric Global Research Center |
| Authors: | H. Piao, General Electric Global Research Center N. Fairley, Casa Software Ltd, UK J. Walton, The University of Manchester, UK |
| Correspondent: | Click to Email |
The recent development of X-ray Photoelectron Spectroscopy (XPS) instrumentation with near-micron spatial resolution has advanced the capability of elemental and chemical state imaging. This work extends the application of imaging XPS to the analysis of real world samples. The presentation also focuses on description of radiation damage of polymers encountered in XPS imaging analysis. The imaging analysis can cause extensive damage to polymers since the acquisition time for creating datasets can be excessive. Understanding of radiation damage in polymers is necessary for successful and validated application of XPS spectromicroscopy.
Keywords: XPS, chemical states, imaging, delamination.