AVS 58th Annual International Symposium and Exhibition
    Plasma Science and Technology Division Wednesday Sessions

Session PS-WeA
Plasma Sources

Wednesday, November 2, 2011, 2:00 pm, Room 201
Moderator: Steve Shannon, North Carolina State University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS-WeA1
Integrated Power Delivery Systems for Next Generation Plasma Processes
Fernando Tomasel, M. Watanabe, D. Carter, Advanced Energy Industries
2:20pm PS-WeA2
Remote VHF Source for High Efficiency Plasma Generation
Dan Carter, D.J. Hoffman, R. Grilley, K. Peterson, Advanced Energy Industries
2:40pm PS-WeA3 Invited Paper
Study of Radio Frequency Breakdown Mechanisms in a Plasma Environment
John Caughman, R.H. Goulding, D.A. Rasmussen, Oak Ridge National Laboratory, C.H. Castano Giraldo, M. Aghazarian, University of Illinois at Urbana Champaign, E.H. Martin, S.C. Shannon, North Carolina State University
4:00pm PS-WeA7
A Narrow Ion Energy Distribution Bias System
Victor Brouk, Advanced Energy Industries, S.C. Shannon, North Carolina State University, D.J. Hoffman, D. Carter, W. Hattel, Advanced Energy Industries
4:20pm PS-WeA8
Effect of Multi-frequency Bias on Ion Energy Distribution in Inductively Coupled Plasma
Ankur Agarwal, A. Balakrishna, S. Rauf, K. Collins, Applied Materials, Inc.
4:40pm PS-WeA9
Electron Energy Distribution at Electrode in a Low Pressure Capacitively Coupled Plasma
Shahid Rauf, L. Dorf, A. Agarwal, K. Collins, Applied Materials, Inc.
5:00pm PS-WeA10 Invited Paper
The Control of Electron Shading and Plasma EEDf in a DC/RF Parallel-Plate Etcher
Lee Chen, Tokyo Electron America
5:40pm PS-WeA12
Negative Plasma Potentials Produced by Electropositive Plasmas in a Multi-Dipole Chamber
Noah Hershkowitz, University of Wisconsin-Madison, L. Oksuz, Suleyman Demirel University, Turkey, J.P. Sheehan, University of Wisconsin-Madison