AVS 58th Annual International Symposium and Exhibition
    Plasma Science and Technology Division Monday Sessions

Session PS-MoM
Advanced FEOL / Gate Etching I

Monday, October 31, 2011, 8:20 am, Room 201
Moderator: Ankur Agarwal, Applied Materials, Inc.


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am PS-MoM1
Impact of Synchronized Plasma Pulsing Technologies on Key Parameters Governing STI Etch Processes
Moritz Haass, M. Darnon, G. Cunge, P. Bodart, C. Petit-Etienne, M. Brihoum, L. Vallier, LTM-CNRS, France, S. Banna, Applied Materials, Inc., O. Joubert, LTM-CNRS, France
8:40am PS-MoM2
Effect of Si Damage on Shallow Source-Drain (SSD) Recess Structures
Joydeep Guha, S. Sriraman, Lam Research Corporation
9:00am PS-MoM3 Invited Paper
Improving Etch Processes by using Pulsed Plasmas
Maxime Darnon, M. Haass, P. Bodart, G. Cunge, C. Petit-Etienne, M. Brihoum, R. Blanc, CNRS-LTM, France, T. David, Cea Leti Minatec Campus, France, E. Pargon, L. Vallier, O. Joubert, CNRS-LTM, France, S. Banna, T. Lill, Applied Materials, Inc.
9:40am PS-MoM5
HfO2 Etching by Pulsed BCl3/Ar Plasma
Paul Bodart, C. Petit-Etienne, G. Cunge, F. Boulard, M. Darnon, L. Vallier, E. Pargon, CNRS-LTM, France, S. Banna, T. Lill, Applied Materials, Inc., O. Joubert, CNRS-LTM, France
10:00am PS-MoM6
Study of Metallic Interfaces Etching for High-K Metal Gate stacks in CMOS 28 nm Technology
Florian Chave, STMicroelectronics, France, L. Vallier, CNRS-LTM, France, P. Gouraud, C. Vérove, STMicroelectronics, France, O. Joubert, CNRS-LTM, France
11:00am PS-MoM9
Double Patterning Challenges for the sub 22nm CMOS Nodes
Sivananda Kanakasabapathy, R. Jung, M. Hartig, S. Schmitz, Y. Yin, IBM Research, S. Raghunathan, L. Jang, GlobalFoundries, E. McLellan, S. Burns, S. Holmes, C.S. Koay, IBM Research, R.H. Kim, GlobalFoundries, G. Landie, ST Microelectronics, D. Horak, IBM Research, Y. Mignot, ST Microelectronics, S. Seo, S.T. Chen, J. Arnold, M. Colburn, B. Haran, IBM Research
11:20am PS-MoM10
Novel Etch Mechanism for High Selectivity Etching of Silicon Nitride over Silicon and Silicon Oxide for Spacer Applications
Sebastian Engelmann, J. Chang, E.A. Joseph, R.L. Bruce, N.C.M. Fuller, W.S. Graham, E.M. Sikorski, S. Balakrishnan, A. Banik, M. Gordon, IBM T.J. Watson Research Center, M. Nakamura, G. Matsuura, ZEON Chemicals L.P., H. Matsumoto, A. Itou, Zeon Corporation
11:40am PS-MoM11
High-Aspect Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma
Y. Taniuchi, Haruo Shindo, Tokai University, Japan