AVS 58th Annual International Symposium and Exhibition | |
Plasma Science and Technology Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | PS+SE-WeM1 Invited Paper 2011 AVS Peter Mark Award Lecture - Microscale, Atmospheric-Pressure Plasmas: A Platform for Nanomaterials Synthesis at Different Length Scales Mohan Sankaran, Case Western Reserve University |
8:40am | PS+SE-WeM3 Surface and In-Depth Modification of LDPE using an Atmospheric Plasma Torch S. Abou Rich, P. Leroy, Universite Libre de Bruxelles, Belgium, N. Wehbe, Universiy of Namur, Belgium, N. Avril, L. Houssiau, University of Namur, Belgium, Francois Reniers, Universite Libre de Bruxelles, Belgium |
9:00am | PS+SE-WeM4 Surface Analysis of Polymers Treated by Remote Atmospheric Pressure Plasma Robert F. Hicks, University of California Los Angeles, E. Gonzalez, Intel Corporation, T.S. Williams, University of California Los Angeles |
9:20am | PS+SE-WeM5 Invited Paper Deposition of SiOx Films by Means of Atmospheric Pressure Microplasma Jets: Study of Deposition Mechanism Jan Benedikt, R. Reuter, D. Ellerweg, K. Ruegner, T. de los Arcos, A. von Keudell, Ruhr-University Bochum, Germany |
11:00am | PS+SE-WeM10 Synthesis of Li4Ti5O12 Nanoparticles Using an Atmospheric Pressure Plasma Jet Shih-min Chang, E.F. Rodriguez, H.C. Li, Y.J. Yang, N.L. Wu, C.C. Hsu, National Taiwan University, Taiwan, Republic of China |
11:20am | PS+SE-WeM11 Laser-Assisted Plasma Coating at Atmospheric Pressure: Production of Yttria-Stabilized Zirconia Thermal Barriers Zihao Ouyang, P. Raman, Y.L. Wu, L. Meng, T.S. Cho, D.N. Ruzic, University of Illinois at Urbana-Champaign |
11:40am | PS+SE-WeM12 Investigation on the Discharge Formation Mechanisms and Surface Analysis of SiO2-like Layers on Polymers Synthesized using High Current Dielectric Barrier Discharge at Atmospheric Pressure Richard van de Sanden, FOM-Inst. for Plasma Phys. Rijnhuizen & Eindhoven Univ. of Tech., Netherlands, A. Premkubar, Eindhoven Univ. of Tech. & M2i, Netherlands, S. Starostin, H. de Vries, Fujifilm Tilburg, Netherlands, M. Creatore, Eindhoven Univ. of Tech., Netherlands |