AVS 58th Annual International Symposium and Exhibition | |
Nanomanufacturing Science and Technology Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
NM-TuP1 Nanoscopic Polymerization of Polyaniline on the Nanostructured Alumina Surface and the Nano-Contact Transfer of the Nanofabricated Polyanil Yohei Watanabe, T. Mori, H. Kato, S. Takemura, T. Hiramatsu, Kanto Gakuin University, Japan |
NM-TuP2 Dielectric Performance of Post Deposition Treated Al2O3 Films Prepared by Using Parallel-Plate Electrode PEALD Chin-Chieh Yu, National Applied Research Laboratories, Taiwan, Republic of China, H.D. Trinh, National Chiao Tung University, Taiwan, Republic of China, B.H. Liu, C.C. Kei, C.N. Hsiao, D.P. Tsai, National Applied Research Laboratories, Taiwan, Republic of China |
NM-TuP3 Effect of Growth Temperature on Optical Properties of TiO2 Films by Atomic Layer Deposition Ming-Hui Chan, C.C. Kei, C.N. Hsiao, W.-H. Cho, C.C. Yu, B.H. Liu, W.C. Chen, D.P. Tsai, National Applied Research Laboratories, Taiwan, Republic of China |
NM-TuP4 Fabrication of Double Nanohoneycombs (Pt/ZnO) with Controllable Size using Nanosphere Lithography and Plasma Enhanced Atomic Layer Deposition C.-T. Lee, Wen-Hao Cho, B.H. Liu, C.C. Kei, D.P. Tsai, National Applied Research Laboratories, Taiwan, Republic of China |
NM-TuP7 Fabrication of Nanopattern Sapphire Substrate by Nanosphere and Nanoimprint Lithography Technology Chun-Ming Chang, M.H. Shiao, D.Y. Chiang, National Applied Research Laboratories, Taiwan, Republic of China, C.T. Yang, Industrial Technology Research Institute, Taiwan, Republic of China, M.J. Huang, National Applied Research Laboratories, Taiwan, Republic of China, W.J. Hsueh, National Taiwan University, Taiwan, Republic of China |
NM-TuP8 Fabrication of Single-Electron Transistor Utilizing Multi-Coated Self-Assembled Monolayer Namyong Kwon, K. Kim, I. Chung, Sungkyunkwan Univ., Republic of Korea |
NM-TuP9 Photoluminescence Studies of Nanostructured Alumina Surfaces Coated by Polythiophene Film and Copper Phthalocyanine Atsuro Ishii, R. Nakashima, H. Kato, S. Takemura, H. Kobe, Y. Watanabe, T. Hiramatsu, Kanto Gakuin University, Japan |
NM-TuP11 Optimization of Criss-Cross Photolithography for 3D NAND Jonathan Germain, J. Smith, J.M. Kim, K.Y. Ko, Applied Materials, Inc. |