| AVS 58th Annual International Symposium and Exhibition | |
| Nanomanufacturing Science and Technology Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 9:00am | NM+MS+NS+TF-MoM3 Invited Paper Industrialization of Atomic Layer Deposition: From Design to Deposition Jill Becker, A. Bertuch, R. Bhatia, L. Lecordier, G. Liu, M. Sershen, M. Sowa, R. Coutu, G.M. Sundaram, Cambridge NanoTech, Inc. |
| 9:40am | NM+MS+NS+TF-MoM5 Improved MOS Characteristics of CeO2/La2O3 and MgO/La2O3 Gate Stacks Prepared by ALD Takuya Suzuki, M. Kouda, Tokyo Institute of Technology and AIST, Japan, K. Kakushima, P. Ahmet, H. Iwai, Tokyo Institute of Technology, Japan, T. Yasuda, AIST, Japan |
| 10:00am | NM+MS+NS+TF-MoM6 Highly Uniform and Conformal Thin Film Metallization with Thermal and Plasma-Enhanced Atomic Layer Deposition M. Toivola, J. Kostamo, T. Malinen, T. Pilvi, T. Lehto, Charles Dezelah, Picosun Oy, Finland |
| 10:40am | NM+MS+NS+TF-MoM8 Invited Paper Atomic Layer Deposition for Continuous Roll-to-Roll Processing Steven M. George, P.R. P. Ryan Fitzpatrick, University of Colorado at Boulder |
| 11:20am | NM+MS+NS+TF-MoM10 Invited Paper High Rate Continuous Roll-to-Roll Atomic Layer Deposition Eric Dickey, Lotus Applied Technology |