AVS 57th International Symposium & Exhibition
    Thin Film Tuesday Sessions

Session TF1-TuM
ALD: Dielectrics for Semiconductors

Tuesday, October 19, 2010, 8:00 am, Room Pecos
Moderator: H. Kim, Yonsei University, Korea


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF1-TuM1 Invited Paper
Feasibility of Wrinkle Free Graphene Process
B.H. Lee, C.H. Cho, S.K. Lim, S.Y. Lee, H.J. Hwang, Y.-G. Lee, U.J. Jung, C.G. Kang, Gwangju Institute of Science and Technology, Korea
8:40am TF1-TuM3
The Effects of Interfacial Organic Layers on the Growth of Thin Al2O3, HfO2 and TaNx Films by Atomic Layer Deposition
K.J. Hughes, S. Issacson, J.R. Engstrom, Cornell University
9:00am TF1-TuM4
Property of Interfacial Layer Induced VFB Shift in Al-related Gate Oxide Deposited by Remote Plasma Atomic Layer Deposition
H.T. Jeon, H. Kim, S. Woo, J. Lee, H. Lee, Hanyang University, Republic of Korea
9:20am TF1-TuM5
Atomic Layer Deposited Pb(Zr,Ti)Ox Films Composited as Ferroelectric and Multiferroic Materials
F. Zhang, T.E. Quickel, Y.-C. Perng, S. Tolbert, J.P. Chang, University of California, Los Angeles
9:40am TF1-TuM6
Y2O3 Atomic Layer Deposition from a Novel Process and its Integration in a Gate First Approach for 0.8 nm Equivalent Oxide Thickness
C. Dubourdieu, CNRS and IBM Research, M.M. Frank, E. Cartier, J. Bruley, S.M. Rossnagel, IBM T.J. Watson Research Center, A. Kellock, IBM Almaden Research Center, V. Narayanan, IBM T.J. Watson Research Center
10:40am TF1-TuM9
Direct Liquid Injection Chemical Vapor Deposition of Nickel Ferrite and Barium Titanate Thin Films
N. Li, A. Wang, A. Gupta, T.M. Klein, University of Alabama
11:00am TF1-TuM10
Structure-Property Relationship in high-k, ALD Al-doped TiO2 Films using Raman Spectroscopy
L.C. Haspert, P. Banerjee, L. Henn-Lecordier, G.W. Rubloff, University of Maryland
11:20am TF1-TuM11
In-situ XPS and Half-Cycle Studies of Atomic Layer Deposited Al2O3 on Group-III Nitride Substrate for MOS-HEMT Applications
P. Sivasubramani, T.J. Park, B.E. Coss, S. McDonnell, R.M. Wallace, J. Kim, University of Texas at Dallas, Y. Cao, D. Jena, H. Xing, University of Notre Dame
11:40am TF1-TuM12
Defect Mechanisms for Chlorosilane Based Self-Assembled Monolayers
S. Miller, A.J. Muscat, University of Arizona