AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Thursday Sessions

Session PS1-ThA
Plasma Modeling

Thursday, October 21, 2010, 2:00 pm, Room Aztec
Moderator: Z. Chen, Applied Materials Inc.


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS1-ThA1
Molecular Dynamics Simulation of Fluorocarbon/hydrogen Ion Beam Interaction with a PMMA (Polymethyl Methacrylate) Surface
Y. Morita, M. Isobe, S. Hamaguchi, Osaka University, Japan
2:20pm PS1-ThA2
Molecular Cross-Section Calculations Enabling Etch-Profile Simulations of a Microwave Source Silicon Etch using Ar/HBr/O2
J. Munro, J. Tennyson, University College London, UK, S.-Y. Kang, Tokyo Electron Limited, Japan, D. Brown, Quantemol Ltd., UK
2:40pm PS1-ThA3
Gas/Ion Temperatures in Multi-Frequency Capacitively Coupled Plasma Sources
A. Agarwal, S. Rauf, K. Collins, Applied Materials Inc.
3:00pm PS1-ThA4
Control of Electron Energy Distributions in Pulsed Capacitively Coupled Plasmas Sustained in Noble and Electronegative Gas Mixtures
S.-H. Song, M.J. Kushner, University of Michigan, Ann Arbor
3:40pm PS1-ThA6
Impact of Frequency Mixing on Plasma Characteristics in Low Pressure Capacitively Coupled Discharges
J.A. Kenney, S. Rauf, K. Collins, Applied Materials Inc.
4:00pm PS1-ThA7
Predicting the Surface Response Upon Simultaneous Plasma Etching and Deposition
N.P. Marchack, C. Pham, J. Hoang, J.P. Chang, University of California Los Angeles
4:20pm PS1-ThA8 Invited Paper
Computational Modeling of DC and Pulsed Microplasmas-Based Space Propulsion Devices
L. Raja, The University of Texas at Austin
5:00pm PS1-ThA10
Feature Profile Simulator FPS-3D
P.E. Moroz, TEL US Holdings
5:20pm PS1-ThA11
3D Numerical Modelling of VHF MHC type SiH4 PECVD for Solar Cells
J. Joo, Kunsan National University, Republic of Korea