AVS 57th International Symposium & Exhibition | |
Plasma Science and Technology | Thursday Sessions |
Session PS1-ThA |
Session: | Plasma Modeling |
Presenter: | J. Munro, University College London, UK |
Authors: | J. Munro, University College London, UK J. Tennyson, University College London, UK S.-Y. Kang, Tokyo Electron Limited, Japan D. Brown, Quantemol Ltd., UK |
Correspondent: | Click to Email |
A set of quantum electron scattering calculations are performed on SiBr and SiBr2 using the electron-molecule code Quantemol-N [3]. The resulting cross-sections are used to complete a set of gas-phase reactions contributing to the etch process. Etch-profile simulations are then performed using the Monte Carlo Feature Profile Model code (MCFPM) [4]. Here we use incident species fluxes derived from simulations of Ar/HBr/O2 plasmas. Results are presented which include an analysis of the contribution of the etch products SiBr and SiBr2.
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