AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Thursday Sessions

Session PS+TF-ThM
Plasma Deposition and Plasma Enhanced ALD

Thursday, October 21, 2010, 8:00 am, Room Galisteo
Moderator: M. Shiratani, Kyushu University, Japan


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:40am PS+TF-ThM3
Room Temperature PECVD Synthesis of Hybrid Organic-Inorganic Nanolaminates
R. Patel, C.A. Wolden, Colorado School of Mines
9:00am PS+TF-ThM4
Role of PEALD System Plasma Source Operation on Substrate Ion Bombardment and the Impact on HfO2 and TiN Film Properties
M.J. Sowa, G.M. Sundaram, E.W. Deguns, R. Bhatia, M.J. Dalberth, A. Bertuch, G. Liu, J.S. Becker, Cambridge NanoTech, Inc.
9:20am PS+TF-ThM5
HfTiSiON Film Growth by N2 Plasma Exposure to Hf-Ti Liquid Nano Particles on SiO2/Si
T. Kitajima, T. Nakano, National Defense Academy, Japan, T.M. Makabe, Keio University, Japan
11:00am PS+TF-ThM10
Improving the Quality of PVD Cu Seed Layer for Interconnect Metallization
A. Dulkin, E. Ko, L. Wu, I. Karim, K. Leeser, K.J. Park, Novellus Systems, Inc., L. Meng, D.N. Ruzic, University of Illinois at Urbana-Champaign
11:20am PS+TF-ThM11
Pulsed Plasma Polymerization of 2-Chloro-p-xylene
I.C. Estrada-Raygoza, P.L.S. Thamban, G. Padron-Wells, L.J. Overzet, M.J. Goeckner, University of Texas at Dallas
11:40am PS+TF-ThM12
Morphological Variation of Plasma Polymerized TiOxCy Films as a Function of Oxygen Concentration during PECVD
L. Sun, H. Jiang, General Dynamics Information Technology, J. Grant, University of Dayton Research Institute, P. Lloyd, UES, Inc., T. Bunning, R. Jakubiak, Air Force Research Laboratory