AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Thursday Sessions
       Session PS+TF-ThM

Paper PS+TF-ThM11
Pulsed Plasma Polymerization of 2-Chloro-p-xylene

Thursday, October 21, 2010, 11:20 am, Room Galisteo

Session: Plasma Deposition and Plasma Enhanced ALD
Presenter: I.C. Estrada-Raygoza, University of Texas at Dallas
Authors: I.C. Estrada-Raygoza, University of Texas at Dallas
P.L.S. Thamban, University of Texas at Dallas
G. Padron-Wells, University of Texas at Dallas
L.J. Overzet, University of Texas at Dallas
M.J. Goeckner, University of Texas at Dallas
Correspondent: Click to Email
Parylene C is a high-quality protective layer used in a wide array of areas that includes dielectric applications, biomedicine and micro-electromechanical systems (MEMS). Using traditional deposition, poor adhesion to a broad range of substrates remains a main concern. Adhesion is greatly improved to almost any type of substrate if the deposition is via plasma polymerization. In the work reported here we use a wide set of data to predict the film growth mechanisms during pulsed plasma polymerization of parylene C. Specifically, we examine plasma gas phase chemistry in a 2-Chloro-p-xylene pulsed discharge using of a novel e-beam probe as well as more traditional Fourier-Transform Infrared Spectroscopy and WISE© probe measurements. We contrast the gas phase chemistry with the bulk properties of the films deposited. Work supported in part by CONACYT Scholarship number 170201 and NSF (Grant CBET- 0922962).