AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Tuesday Sessions
       Session PS2-TuM

Paper PS2-TuM10
Frequency Probe Measurements in Processing Plasmas

Tuesday, October 19, 2010, 11:00 am, Room Galisteo

Session: Plasma Diagnostics, Sensors and Control
Presenter: D.R. Boris, NRL/NRC Postdoctoral Research Associate
Authors: D.R. Boris, NRL/NRC Postdoctoral Research Associate
S.G. Walton, Naval Research Laboratory
M. Baraket, NRL/NRC Postdoctoral Research Associate
E.H. Lock, Naval Research Laboratory
R.F. Fernsler, Naval Research Laboratory
Correspondent: Click to Email

Plasma density measurements are an essential tool in understanding and controlling processing plasmas across a wide range of applications. Charge collection probes (Langmuir probes) are of limited utility in depositing plasmas, high pressure applications or in processes that require the use of reactive gases, as these environments result in unreliable data acquisition. Plasma frequency probes are an attractive alternative to Langmuir probes in such applications since they do not suffer significant performance degradation in these environments. Frequency probes are capable of measuring plasma density over a range of 108 to 1012 cm-3 and, it is possible to extract the plasma potential and electron temperature. This presentation details the use of plasma frequency probes, in a variety of different geometries, to measure plasma parameters in unique systems, such as plasma produced by electron beams, operating at higher pressures, or in reactive gases (O2 and SF6). Where possible these measurements are compared with Langmuir probe measurements for identical experimental parameters.