AVS 57th International Symposium & Exhibition
    Plasma Science and Technology Tuesday Sessions
       Session PS1-TuA

Paper PS1-TuA12
The Evaluation of Sidewall Polymerization during Platinum Dry Etching Process using Inductively Coupled Cl2/O2/Ar and CH3OH Plasmas

Tuesday, October 19, 2010, 5:40 pm, Room Aztec

Session: Advanced BEOL/Interconnect Etching II
Presenter: J.Y. Moon, HYNIX Semiconductor Inc., Republic of Korea
Authors: J.Y. Moon, HYNIX Semiconductor Inc., Republic of Korea
J.W. Park, HYNIX Semiconductor Inc., Republic of Korea
M.S. Lee, HYNIX Semiconductor Inc., Republic of Korea
B.G. Jyun, HYNIX Semiconductor Inc., Republic of Korea
W.J. Choi, HYNIX Semiconductor Inc., Republic of Korea
S.H. Cho, HYNIX Semiconductor Inc., Republic of Korea
J.S. Roh, HYNIX Semiconductor Inc., Republic of Korea
S.-K. Park, HYNIX Semiconductor Inc., Republic of Korea
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It has been reported that platinum is the most appropriate resistive switching RAM (ReRAM) electrode material due to its good oxidation-resistance, high electrical conductivity and low leakage current characteristics. However, platinum does not easily form the volatile products, and the unwanted sidewall polymer which is produced during plasma etch process gives a large shift in the pattern size of the etched pattern and also makes it difficult to remove. In this study, experimental studies of platinum etching process have been performed to understand the characteristics of sidewall polymerization using inductively coupled Cl2/O2/Ar and CH3OH plasmas etching process. The effects of etch parameters such as gas combination and substrate temperature on the characteristics of etch properties of platinum were also investigated to minimize sidewall polymer re-deposition in the point of re-deposited sidewall polymers. The thickness of re-deposited polymers related to platinum were measured and studied by high resolution transmission electron microscopy (HR-TEM). The chemical reactions on the etched surface also have been studied by X-ray photoelectron spectroscopy (XPS).