AVS 56th International Symposium & Exhibition
    Thin Film Tuesday Sessions

Session TF2-TuM
ALD/CVD: Basics, Organics, Electronics

Tuesday, November 10, 2009, 8:00 am, Room B4
Moderator: R.G. Gordon, Harvard University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF2-TuM1 Invited Paper
How Surface Reactions Afford Ultra-Conformal CVD: A Zone Diagram and the Application of Suppressor Species
J.R. Abelson, University of Illinois at Urbana-Champaign
8:40am TF2-TuM3 Invited Paper
Functional and Conducting Polymer Thin Films by Vapor Deposition
K. Gleason, Massachusetts Institute of Technology
9:20am TF2-TuM5
CVD of Three Aminosilanes on Silicon Oxide: Effect of Silane Concentration, Surface Characterization and Stability, and Cyanine Dye Adsorption
M.R. Linford, F. Zhang, Brigham Young University, H. Samha, Southern Utah University, K. Sautter, Yield Engineering Systems, R.C. Davis, Brigham Young University
9:40am TF2-TuM6
Novel Precursors for CVD of Amorphous and Crystalline Cobalt Group Metal-Phosphide Films
J. Rivers, R. Jones, The University of Texas at Austin
10:40am TF2-TuM9 Invited Paper
Kinetic Study on InGaAsP-MOCVD Using Selective Area Growth and its Application to OEIC Device Fabrication
Y. Shimogaki, The University of Tokyo, Japan
11:20am TF2-TuM11
OLED Encapsulation by Room Temperature Plasma-Assisted ALD Al2O3 Films
W. Keuning, M. Creatore, E. Langereis, Eindhoven University of Technology, Netherlands, H. Lifka, P. van de Weijer, Philips Research Laboratories, Netherlands, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
11:40am TF2-TuM12
Controlled Doping of CVD Diamond with Mid-to-High Z Metals
M.M. Biener, J. Biener, Lawrence Livermore National Laboratory, H. Obloh, Fraunhofer-Institut für Angewandte Festkörperphysik, Germany, S.O. Kucheyev, Y.M. Wang, Lawrence Livermore National Laboratory, W. Mueller-Sebert, Fraunhofer-Institut für Angewandte Festkörperphysik, Germany, B.S. El-Dasher, Lawrence Livermore National Laboratory, A. Kriele, Fraunhofer-Institut für Angewandte Festkörperphysik, Germany, N.E. Teslich Jr., Lawrence Livermore National Laboratory, C. Wild, Fraunhofer-Institut für Angewandte Festkörperphysik, Germany, A.V. Hamza, Lawrence Livermore National Laboratory