| AVS 56th International Symposium & Exhibition | |
| Advanced Surface Engineering | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SE2-MoM1 Invited Paper Industrialization of Metal Ion Sputtering R. Cremer, KCS Europe |
| 9:00am | SE2-MoM3 Structural and Mechanical Behavior of Fullerene-Like and Amorphous Carbon Nitride Thin Films Deposited by HPPMS S. Schmidt, G. Greczynski, Linköping University, Sweden, E. Broitman, Carnegie Mellon University, L. Hultman, Linköping University, Sweden |
| 9:20am | SE2-MoM4 Effects of the Working Pressure and Pulse Parameters on the Ion Energy and Mass Distributions in Modulated Pulse Power Sputtering Plasma W.D. Sproul, Reactive Sputtering, Inc., J. Lin, J.J. Moore, B. Mishra, Colorado School of Mines, J.A. Rees, Hiden Analytical Ltd, UK, Z.L. Wu, J. Wang, Colorado School of Mines, R. Chistyakov, B. Abraham, Zond/Zpulser |
| 10:00am | SE2-MoM6 Effects of HiPIMS Plasma Transport on Thin Film Deposition D. Lundin, Linköping University, Sweden, N. Brenning, M.A. Raadu, Royal Institute of Technology, Sweden, U. Helmersson, Linköping University, Sweden |
| 10:40am | SE2-MoM8 Invited Paper Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics A. Anders, Lawrence Berkeley National Laboratory |
| 11:20am | SE2-MoM10 Optical Diagnostics of HIPIMS Discharges: Dependence of Film Growth on Control Parameters M. Lange, UTC and AFRL/RXBT, J. Jones, AFRL/RXBT, C. Muratore, UTC and AFRL/RXBT, A. Reed, AFRL/RXBT, A. Waite, UTC and AFRL/RXBT, A. Voevodin, AFRL/RXBT |
| 11:40am | SE2-MoM11 Time-resolved Plasma Characterization in Modulated Pulse Power (MPP) Magnetron Sputtering A.N. Cloud, R.E. Flauta, M.J. Neumann, S.L. Rohde, D.N. Ruzic, University of Illinois at Urbana-Champaign |