| 2:00pm |
PS1-WeA1 Invited Paper
Plasma Prize Lecture - Modeling and Simulation of Microplasma Discharges
D.J. Economou, University of Houston |
| 2:40pm |
PS1-WeA3
Feature Scale Modeling of High Aspect Ratio Dielectric Etch
P.J. Stout, J.A. Kenney, S. Rauf, Applied Materials |
| 3:00pm |
PS1-WeA4
Feature Profile Evolution: From Plasma Etching and Deposition to Surface Roughness Formation and its Propagation
J. Hoang, J. Chang, University of California, Los Angeles |
| 4:00pm |
PS1-WeA7
Three-Dimensional Modeling of Ion Angular and Energy Distributions in Capacitively Coupled Plasmas
J.A. Kenney, P.J. Stout, S. Rauf, K. Collins, Applied Materials |
| 4:20pm |
PS1-WeA8
A Global (Volume Averaged) Model of the Chlorine Discharge
E.G. Thorsteinsson, J.T. Gudmundsson, University of Iceland |
| 4:40pm |
PS1-WeA9
Characterization of Very High Frequency Capacitively Coupled Plasmas
K. Bera, L. Dorf, S. Rauf, K. Collins, Applied Materials, Inc. |
| 5:20pm |
PS1-WeA11
Investigation of Standing Wave Formation in the Large Area Capacitively Coupled RF Driven Processing Plasma Source
S.H. Lee, M.S. Choi, G.H. Kim, Seoul National University, Republic of Korea |