AVS 56th International Symposium & Exhibition | |
Applied Surface Science | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | AS-FrM1 Invited Paper Combined XPS and AES Characterization of Nano Structures Developed for Advanced Energy Conversion and Storage Materials C. Hitzman, Stanford University |
9:00am | AS-FrM3 Investigation of Internal Structure of Drug Products by TOF-SIMS and CT X. Dong, C.A.J. Kemp, Eli Lilly and Company |
9:20am | AS-FrM4 Effectiveness of Passivation Techniques on Hydrogen Desorption in a Pure Tritium Environment S. Woodall, E. Pines, D. Valles-Rosales, New Mexico State University |
9:40am | AS-FrM5 Comparison of Supported Catalyst Particle Size Determination by Low Energy Ion Scattering (LEIS) and Transmission Electron Microscopy (TEM) R.A.P. Smith, D. Ozkaya, Johnson Matthey Technology Centre, UK, H. Brongersma, T. Grehl, ION-TOF GmbH, Germany, H.R.J. ter Veen, Tascon GmbH, Germany |
10:00am | AS-FrM6 Characterization of Organic Light Emitting Devices Via Surface Analysis and Electron Microscopy D.J. Gaspar, A.S. Lea, A.B. Padmaperuma, Z. Zhu, D.W. Matson, L. Wang, Pacific Northwest National Laboratory, J. Berry, D.S. Ginley, National Renewable Energy Laboratory |
10:20am | AS-FrM7 Structure and Composition of Plasma Treated Polystyrene Surfaces Determined by Complementary Analytical Techniques P. Mack, R.G. White, T. Carney, Thermo Fisher Scientific, UK, E.H. Lock, S.G. Walton, Naval Research Laboratory, D.Y. Petrovykh, Naval Research Laboratory and University of Maryland |
10:40am | AS-FrM8 An Investigation of Detection Limits and Common Interference Factors in Depth Profiling Hydrogen and Deuterium by Time-of-Flight Secondary Ion Mass Spectrometry Z. Zhu, V. Shutthanandan, Pacific Northwest National Laboratory |
11:00am | AS-FrM9 Ultra-Low-Angle-Microtomy to Prepare Fuel Cell Membrane Electrode Assemblies for XPS Analysis K.S. Reeves, K.L. More, Oak Ridge National Laboratory, R.G. White, T.S. Nunney, A.E. Wright, Thermo Fisher Scientific, UK, H.M. Meyer III, Oak Ridge National Laboratory |
11:20am | AS-FrM10 Acquisition of Quantitative Implant Coverage Maps of Semiconductor Devices with ToF-SIMS J.A. Ohlhausen, M.L. Anderson, J.J. Sniegowski, Sandia National Laboratories |
11:40am | AS-FrM11 Investigations of Interactions Between Hafnium and Carbon During High Temperature Anneals B.R. Rogers, R.D. Geil, B.W. Schmidt, Vanderbilt University |