| AVS 53rd International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-ThM1 Invited Paper Tuning Polymer Surfaces by Cold Plasma Technology R. d'Agostino, University of Bari, Italy |
| 8:40am | PS2-ThM3 Morphological and Chemical Evolution of Model Resist Polymers for Plasma/Energetic Beam Templating Materials* R. Phaneuf, T. Kwon, R.L. Bruce, S. Engelmann, G.S. Oehrlein, University of Maryland, B. Long, G. Willson, University of Texas, Austin, D.B. Graves, D.G. Nest, M. Goldman, J. Vegh, University of California, Berkeley, A. Alizadeh, GE Electric Global Research Center |
| 9:00am | PS2-ThM4 Advanced Plasma Polymerization Methods to Deposit Multifunctional Coatings D. Hegemann, M.M. Hossain, D.J. Balazs, Empa, Swiss Materials Science & Technology, Switzerland |
| 9:20am | PS2-ThM5 Low Temperature PECVD of Silicon Oxynitride Thin Films from Dimethylaminosilanes: Role of Oxygen Addition R. Di Mundo, F. Fracassi, R. d'Agostino, University of Bari, Italy, F. Palumbo, IMIP-CNR |
| 9:40am | PS2-ThM6 Plasma-Assisted Growth of Moisture Diffusion Barriers on Polymers: From Chemical Vapor Deposition to Atomic Layer Deposition M. Creatore, E. Langereis, I. Volintiru, A. Milella, W.M.M. Kessels, M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands |
| 10:00am | PS2-ThM7 Super-Hydrophobic Transparent Polymer Surfaces Fabricated by Plasma Etching and Deposition N. Vourdas, M.E. Vlachopoulou, A. Tserepi, E. Gogolides, Institute of Microelectronics, NCSR Demokritos, Greece |
| 10:20am | PS2-ThM8 Fabrication and Characterization of Plasma Processed Surfaces with Tuned Wettability P. Colpo, A. Ruiz, L. Ceriotti, A. Valsesia, F. Brétagnol, G. Ceccone, D. Gilliland, F. Rossi, European Commission, Institute for Health and Consumer Protection, Italy |
| 10:40am | PS2-ThM9 Plasma-Polymerised Surface Chemical Gradients as Platforms for Making Biomolecule Gradients D.E. Robinson, R.D. Short, D.J. Buttle, University of Sheffield, UK, T. Day, A. Marson, University of Manchester, UK, K. Parry, Plasso Technology |