| AVS 53rd International Symposium | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS1-WeM1 Carbon Exposed to Hydrogen Plasma of ITER Relevant Conditions in Pilot-PSI G.J. van Rooij, W.A.J. Vijvers, J. Westerhout, H.J.N. van Eck, W.R. Koppers, V. Veremiyenko, W.J. Goedheer, B. de Groot, P. Smeets, FOM-Inst. for Plasma Phys., The Netherlands, R. Engeln, D.C. Schram, Eindhoven Univ. of Tech., The Netherlands, H.J. van der Meiden, N.J. Lopes Cardozo, A.W. Kleyn, FOM-Inst. for Plasma Phys., The Netherlands |
| 8:40am | PS1-WeM3 Control of Atomic Layer Degradation on Si Substrate T. Tatsumi, Sony Corporation, Japan, Y. Nakamura, T. Harano, Sony Semiconductor Kyushu Corporation, Japan, K. Kugimiya, Sony Corporation, Japan, T. Kawase, S. Hamaguchi, Osaka University, Japan, S. Iseda, Sony Semiconductor Kyushu Corporation, Japan |
| 9:00am | PS1-WeM4 Modifications of Advanced Photoresist Polymers after Plasma Processing S. Engelmann, R.L. Bruce, B.F. Smith, T. Kwon, R. Phaneuf, G.S. Oehrlein, Univ. of Maryland College Park, C. Andes, Rohm & Haas Electronic Materials, D.B. Graves, D.G. Nest, M. Goldman, UC, Berkeley, E.A. Hudson, Lam Research Corp., P. Lazzeri, E. Iacob, M. Anderle, ITC-irst, Center for Sci. and Tech. Res., Italy |
| 9:20am | PS1-WeM5 Study of Energetic Ion and Radical Beams Interacting with Advanced Photoresist Polymers D.G. Nest, M. Goldman, D.B. Graves, UC Berkeley, S. Engelmann, R.L. Bruce, B.F. Smith, T. Kwon, R. Phaneuf, G.S. Oehrlein, Univ. of Maryland, C. Andes, Rohn and Haas Electronic Materials, E.A. Hudson, Lam Research Corp., P. Lazzeri, M. Anderle, ITC-Irst, Italy |
| 9:40am | PS1-WeM6 Investigation of Plasma-Polymer Interactions for Plasma/Energetic Beam Templating of Materials R.L. Bruce, C. Dutton, G.S. Oehrlein, S. Engelmann, T. Kwon, R. Phaneuf, Univ. of Maryland, College Park, B. Long, G. Willson, Univ. of Texas, Austin, D.B. Graves, D.G. Nest, J. Vegh, UC, Berkeley, A. Alizadeh, GE Electrics Global Research Center |
| 10:40am | PS1-WeM9 Molecular Dynamics Simulations of Interactions of Ions and Radicals with Organic Masking Materials J.J. Végh, D.G. Nest, M. Goldman, D.B. Graves, University of California at Berkeley, R.L. Bruce, S. Engelmann, T. Kwon, R. Phaneuf, G.S. Oehrlein, University of Maryland, College Park, B. Long, G. Willson, University of Texas, Austin, A. Alizadeh, GE Electric Global Research Center |
| 11:00am | PS1-WeM10 Scattering Dynamics of Fluorinated Ions on Surfaces of Relevance to Plasma Etching M.J. Gordon, LTM/CNRS, France, X. Qin, J. Mace, K.P. Giapis, California Institute of Technology |
| 11:20am | PS1-WeM11 Plasma-Surface Interactions During Deposition of Hard Carbon Materials D. Liu, J.M. Stillhan, E.R. Fisher, Colorado State University |
| 11:40am | PS1-WeM12 In Situ Surface Diagnostics during Room Temperature Plasma Deposition of Polycrystalline Si Films E.S. Aydil, University of Minnesota, R.C. Mani, Applied Materials |
| 12:00pm | PS1-WeM13 In-situ Spectroscopic and Kelvin Probe Studies of the Modification of Passive Films on Metals in Low Temperature Plasmas M. Giza, T. Titz, G. Grundmeier, Max-Planck-Institut fuer Eisenforschung, Germany |