| AVS 53rd International Symposium | |
| Electronic Materials and Processing | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | EM+TF-FrM1 Chemical Analyses and Electrical Studies of HfO@sub 2@/Y@sub 2@O@sub 3@, Y@sub 2@O@sub 3@/HFO@sub 2@ Bilayered and Y@sub x@Hf@sub y@O@sub z@ Intermixed Dielectric Materials for MIM Capacitors M. Kahn, C. Vallee, C. Dubourdieu, M. Bonvalot, J.R. Plaussu, J. Ducote, T. Baron, O. Joubert, LTM/CNRS, France |
| 8:20am | EM+TF-FrM2 Process-Dependent Interface States at Mo/Hafnium Oxide/Si Interfaces S. Walsh, L. Fang, The Ohio State University, J.K. Schaeffer, E. Weisbrod, Freescale Semiconductor, Inc., L.J. Brillson, The Ohio State University |
| 8:40am | EM+TF-FrM3 Invited Paper Materials Challenges for High Permittivity Gate Dielectrics and Metal Gate Electrodes J.K. Schaeffer, D. Gilmer, S. Samavedam, M. Raymond, D.H. Triyoso, R.I. Hegde, M. Stoker, S. Kalpat, C. Capasso, B. Taylor, P.J. Tobin, B.E. White, Freescale Semiconductor, Inc., S. Walsh, L. Fang, L.J. Brillson, The Ohio State University |
| 9:20am | EM+TF-FrM5 Invited Paper Molecular Beam Epitaxy of Multifunctional Materials Using a Chloride Refractory Metal Chemistry W.A. Doolittle, A.G. Carver, W. Henderson, W. Laws Calley, S.-S. Kim, Georgia Institute of Technology |
| 10:00am | EM+TF-FrM7 Magnesium Oxide Thin Film 'Bridge' on Hexagonal Silicon Carbide for Integration of Functional Oxides T.L. Goodrich, Z. Cai, K.S. Ziemer, Northeastern University |
| 10:20am | EM+TF-FrM8 Zirconium Dioxide Formation on Silicon Surfaces by Metal-Organic Chemical Vapor Deposition in UHV A. Sandell, P.G. Karlsson, J.H. Richter, Uppsala University, Sweden, J. Blomquist, P. Uvdal, Lund University, Sweden, T.M. Grehk, Hogskolan Dalarna, Sweden |
| 10:40am | EM+TF-FrM9 Controlling Interfacial Reactions between HfO@sub 2@and Si using Ultra-Thin Diffusion Barriers R.R. Katamreddy, University of Illinois at Chicago, R. Inman, G. Jursich, A. Soulet, American Air Liquide, C.G. Takoudis, University of Illinois at Chicago |
| 11:00am | EM+TF-FrM10 Comparison of the Calculated Electronic Structure of Oxygen and Nitrogen Adsorption onto Ge(100) S.R. Bishop, T.J. Grassman, A.C. Kummel, University of California, San Diego |
| 11:20am | EM+TF-FrM11 Thermal Stability of High-k Dielectrics on Ge(001) F.S. Aguirre-Tostado, M.J. Kim, R.M. Wallace, University of Texas at Dallas, R. Sreenivasan, K.-I. Seo, C.O. Chui, K.C. Saraswat, P.C. McIntyre, Stanford University, F.A. Stevie, R. Garcia, Z. Zhu, D.P. Griffis, North Carolina State University |
| 11:40am | EM+TF-FrM12 Oxidation Properties of Al-nanostructures on Si Surfaces P. Morgen, University of Southern Denmark, C. Janfelt, University of Copenhagen, Denmark, K. Pedersen, University of Aalborg, Denmark, Z.S. Li, University of Aarhus, Denmark |