| AVS 53rd International Symposium | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS-ThA1 A Fundamental Investigation of Erucamide Migration in Polyolefin Matrices J. Chen, B. Walther, J. Li, T. Hu, The Dow Chemical Company |
| 2:20pm | AS-ThA2 Phenomenological Relationships Between Chemistry and Mechanical Properties Derived from ToF-SIMS and Nanoindentation Observations G.L. Fisher, Physical Electronics, C. Szakal, N. Winograd, The Pennsylvania State University, J.G. Swadener, Los Alamos National Laboratory |
| 2:40pm | AS-ThA3 Invited Paper Multi-technique, Multivariate Analysis Methods for Enhanced Sample Characterization J.E. Fulghum, K. Artyushkova, S. Pylypenko, J.L. Fenton, K.M. Archuleta, University of New Mexico, L. Williams, University of New Mexcio |
| 3:20pm | AS-ThA5 Multi-Technique Characterization of Niobium Surfaces for Superconducting Radio Frequency (SRF) Accelerators H. Tian, College of William & Mary, C.E. Reece, Thomas Jefferson National Accelerator Facility, M.J. Kelley, College of William & Mary, S. Wang, L. Plucinski, K.E. Smith, Boston University, M.M. Nowell, Edax Tsl |
| 3:40pm | AS-ThA6 Ion Sputtering and the Static Limit for Nanoparticles D.J. Gaspar, Z. Zhu, A.S. Lea, D.R. Baer, M.H. Engelhard, PNNL |
| 4:00pm | AS-ThA7 Optimised XPS Depth Profiling of Aluminium Surfaces C. Blomfield, A.J. Roberts, Kratos Analytical Ltd, UK, J.C. Walmsley, Sintef, Trondeim Norway |
| 4:20pm | AS-ThA8 Characterization and Metrology Challenges in SiON Gate Thin Films for ULSI Technology G. Conti, C. Lazik, Y. Uritsky, T.C. Chua, C. Czarnik, Applied Materials, S.R. Bryan, Physical Electronics, T. Gustafsson, E. Garfunkel, Rutgers University |
| 4:40pm | AS-ThA9 Ultimate Nanoprobing in UHV: Four independent Scanning Tunneling Microscopes Navigated by High Resolution UHV SEM M. Maier, J. Westermann, T. Berghaus, Omicron NanoTechnology GmbH, Germany |