AVS 53rd International Symposium
    Plasma Science and Technology Friday Sessions
       Session PS2-FrM

Paper PS2-FrM3
In-Situ Characterization of Oxygen Plasma Surface Etching by Infrared-Visible Sum Frequency Spectroscopy

Friday, November 17, 2006, 8:40 am, Room 2011

Session: Diagnostics
Presenter: D. Farrow, Sandia National Laboratories
Authors: D. Farrow, Sandia National Laboratories
G.A. Hebner, Sandia National Laboratories
E.V. Barnat, Sandia National Laboratories
Correspondent: Click to Email
Unlike many other techniques used to characterize surfaces under plasma exposure, Infrared-visible sum frequency (IVSF) generation is a surface specific probe molecular vibrations that can be carried in situ to follow molecular interactions and plasma initiated chemistry at the interface in quasi real time. We present an in-situ characterization of octadecyltrimethoxysilane monolayers on Quartz in the presence of DC oxygen plasma based on hydrocarbon lines in the IVSF spectra as a function of plasma exposure time, voltage and oxygen pressure. These will be correlated with ellipsometry and infrared absorption measurements of samples under equivalent conditions. This test system will be used to demonstrate the unique advantages and limitations of IVSF in plasma systems.