AVS 53rd International Symposium
    Plasma Science and Technology Friday Sessions
       Session PS1-FrM

Paper PS1-FrM7
Transient Differential Charging of High Aspect Ratio Dielectric Features

Friday, November 17, 2006, 10:00 am, Room 2009

Session: Plasma-Surface Interactions III
Presenter: J.A. Kenney, University of Texas at Austin
Authors: J.A. Kenney, University of Texas at Austin
G.S. Hwang, University of Texas at Austin
Correspondent: Click to Email
Plasma processing of high aspect ratio dielectric structures is well-known to encounter complications due to differential charging of features, owing to the dissimilar natures of the ion and electron angular distributions. As device dimensions shrink to below 100 nm, however, the differential charging of the features is no longer an approximate steady-state. Rather, the charging behavior oscillates as individual ions and electrons have a larger impact on the local electric fields. We investigate this phenomenon and its impact on the ion energy and angular distributions exiting the high aspect ratio structure, using a range of values for the surface conduction and entering ion energy and angular distributions. In addition, we look at how this behavior influences feature profile evolution, also as a function of the incoming ion energy and angular distributions.