AVS 53rd International Symposium
    Manufacturing Science and Technology Tuesday Sessions
       Session MS-TuA

Paper MS-TuA8
Large-Scaled Line Plasma Production by Evanescent Microwave in a Narrow Rectangular Waveguide

Tuesday, November 14, 2006, 4:20 pm, Room 2018

Session: Process Integration and Modeling for Nano-scale Semiconductor Devices
Presenter: E. Abdel Fattah, ADTEC Plasma Technology Co. LTD, Japan
Authors: E. Abdel Fattah, ADTEC Plasma Technology Co. LTD, Japan
S. Fijii, ADTEC Plasma Technology Co. LTD, Japan
H. Shindo, Tokai University, Japan
Correspondent: Click to Email
Long line-shaped plasmas are attractive for use in material processing in manufacturing industries, such as .at panel displays (FPDs) and surface modification of large- area thin films. Several types of plasmas have been developed to meet those needs. In this study, long line-shaped microwave plasma was generated employing a narrow rectangular waveguide. The wavelength of a microwave in a waveguide increases in accordance with the width of the waveguide. The objective of this work is to provide a method of large-scaled line plasma production by employing narrow width rectangular waveguide. A narrow and flattened rectangular waveguide was prepared with the internal dimensions of 1000mm length, 59 to 62mm width and 5mm height. The waveguide was connected to a TE10 mode rectangular waveguide (WST-AD standard). In this narrowed waveguide, the microwave is cutoff, but the evanescent wave is employed to produce the plasma. Two types of line-shaped plasmas was generated; one being a cavity type and the other a slit type. The cavity type line-shaped plasma has a quartz tube in the waveguide as a discharge tube and helium gas as well as argon was supplied into the quartz tube through orifices of the waveguide. The slit type line-shaped plasma has a slit on its side. A quartz tube as a discharge tube was set beside the slit and helium gas as well as argon gas is supplied into it. Electric field intensity and optical emission intensity were then measured. Uniformity of line-shaped plasmas was improved by reducing the width of the waveguide and the microwave power in both types of line-shaped plasmas. In particular, the uniform line plasma could be produced as long as 1000mm in length at 100 Torr pressure. The uniformity was confirmed by both the measurements of electric field and optical emission intensity.