| AVS 52nd International Symposium | |
| Thin Films | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-TuA1 Invited Paper Materials Available by ALD R.G. Gordon, Harvard University |
| 2:40pm | TF-TuA3 Ru ALD and Applications for Advanced Devices H. Lee, S.J. Lim, W.J. Maeng, H. Kim, POSTECH, South Korea |
| 3:00pm | TF-TuA4 Atomic Layer Deposition of Ruthenium on Organic Self Assembled Monolayers for Work Function Tuning K.J. Park, D.B. Terry, G.N. Parsons, North Carolina State University |
| 3:20pm | TF-TuA5 Quartz Crystal Microbalance Measurements of W ALD Nucleation on Al@sub 2@O@sub 3@ R.A. Wind, F.H. Fabreguette, S.M. George, University of Colorado |
| 3:40pm | TF-TuA6 Novel ALD Reactor Design and Metrology Study for Tungsten ALD Process W. Lei, L. Henn-Lecordier, G.W. Rubloff, University of Maryland |