| AVS 52nd International Symposium | |
| Thin Films | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+NS-MoA1 Invited Paper Beam-Induced Nano-Structuring for Advanced Mask Repair T. Liang, Intel Corporation |
| 2:40pm | TF+NS-MoA3 Electron Beam Induced Processing Techniques for Advanced Lithography Mask Repair D.A. Smith, J.D. Fowlkes, University of Tennessee, Knoxville, T. Liang, Intel Corporation, P.D. Rack, University of Tennessee, Knoxville |
| 3:00pm | TF+NS-MoA4 Reduction of Laser-Induced Roughness in a-Si:H Surfaces for Vacuum Compatible Lithography R.N. Jacobs, E.W. Robinson, A.J. Stoltz, J.H. Dinan, US Army RDECOM CERDEC Night Vision and Electronic Sensors Directorate, L.G. Salamanca-Riba, University of Maryland, College Park |
| 3:20pm | TF+NS-MoA5 Maskless, Direct-Write Nanolithography using Electron Beam-Induced Deposition S.J. Randolph, J.D. Fowlkes, P.D. Rack, University of Tennessee, Knoxville |
| 3:40pm | TF+NS-MoA6 Focused Ion Beam Sculpting of Curved Shapes in Metals and Amorphizable Solids D.P. Adams, M.J. Vasile, Sandia National Laboratories |
| 4:00pm | TF+NS-MoA7 Invited Paper Focused Electron and Ion Beam Processing and Fabrication J. Melngailis, University of Maryland, I. Utke, EMPA, Thun, Switzerland, P. Hoffmann, EPFL, Lausanne, Switzerland |
| 4:40pm | TF+NS-MoA9 Sub-Micron Features Using a Focused Ion Beam and Novel Resist Structures M.H. Ervin, U.S. Army Research Laboratory |