| AVS 52nd International Symposium | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-TuM1 Investigation of Plasma-Surface Interaction by Sheath-Lens Focusing Effects E. Stamate, H. Sugai, Nagoya University, Japan |
| 8:40am | PS-TuM2 Effects of Polymer Deposition on Density Stabilization and Loss Rate of Radical Species in Fluorocarbon Plasmas K. Kumagai, K. Nakamura, Chubu University, Japan, K. Oshima, T. Tatsumi, Sony, Japan |
| 9:00am | PS-TuM3 Angular Dependence of Si@sub 3@N@sub 4@ Etch Rates and the Etch Selectivity of SiO@sub 2@ to Si@sub 3@N@sub 4@ at Different Bias Voltages in a High Density C@sub 4@F@sub 8@ Plasma J.-K. Lee, J.-H. Min, S.H. Moon, Seoul National University, South Korea |
| 9:20am | PS-TuM4 Fluorocarbon Film Deposition in a Gap Structure and Correlation With Trench Sidewall Angle for Fluorocarbon Chemistries in Capacitively Coupled Discharges L. Ling, X. Hua, B. Orf, G.S. Oehrlein, University of Maryland at College Park, E.A. Hudson, Lam Research Corp., P. Jiang, Texas Instruments, Y. Wang, National Institute of Standards and Technology |
| 9:40am | PS-TuM5 Invited Paper The Spontaneous Etching of Silicon by F Atoms, Cl Atoms and XeF@sub 2@ : A Unified Model Supported by Experiment and Simulation H. Winters, Unversity of California at Berkeley, D. Humbird, D.B. Graves, University of California, Berkeley |
| 10:20am | PS-TuM7 Molecular Dynamics Simulations of Ar@super +@ Bombardment of Si: Characterizing Ion-Induced Disorder at Surfaces D. Humbird, Lam Research Corporation, D.B. Graves, University of California at Berkeley, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 10:40am | PS-TuM8 Fluorocarbon Polymer Layers and Etching: the Role of Fluctuations, Cluster Ejection, and Redeposition J.J. Vegh, D. Humbird, D.B. Graves, University of California, Berkeley |
| 11:00am | PS-TuM9 Molecular Dynamics Investigation of the Etching of Passivated SiOCH Low-@kappa@ Dielectric Films V. Smirnov, A. Stengatch, K. Gainullin, V. Pavlovsky, SarovLabs, Russia, S. Rauf, P. Ventzek, Freescale Semiconductor, Inc. |
| 11:20am | PS-TuM10 Scattering Dynamics of Energetic F@super +@ Ions on Si and Al Surfaces J. Mace, M.J. Gordon, K.P. Giapis, California Institute of Technology |
| 11:40am | PS-TuM11 IRIS Studies of SiCl@sub x@ Surface Interactions in SiCl@sub 4@ Plasmas I.T. Martin, D. Liu, E.R. Fisher, Colorado State University |