| AVS 52nd International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-ThA1 Characteristics of Large-diameter Plasma using a Radial Line Slot Antenna C. Tian, T. Nozawa, K. Ishibasi, H. Kameyama, T. Morimoto, Tokyo Electron LTD., Japan |
| 2:20pm | PS-ThA2 Application of the Shaped Electrode Technique to a Large Area Rectangular Capacitively-Coupled Plasma Reactor to Suppress Standing Wave Non-Uniformity L. Sansonnens, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland, C. Ellert, A. Buechel, UNAXIS-Balzers AG, Liechtenstein, H. Schmidt, A.A. Howling, C. Hollenstein, EPFL, Switzerland |
| 2:40pm | PS-ThA3 Invited Paper Characteristics of Internal Linear Inductively Coupled Plasma and Its Etching Properties for Flat Panel Display Applications G.Y. Yeom, K.N. Kim, C.K. Oh, Sungkyunkwan University, Korea |
| 3:20pm | PS-ThA5 Investigation of Frequency and Magnetic Field Effect on Single and Multiple Frequencies Capacitively Coupled Plasma Reactors T. Panagopoulos, A.M. Paterson, J.P. Holland, Applied Materials Inc. |
| 3:40pm | PS-ThA6 Independent Control of Backscattering Energy and Sputter Rate in a VHF-DC Superimposed Magnetron Source H. Toyoda, Y. Sakashita, Y. Takagi, K. Sasaki, J. Gao, T. Kato, S. Iwata, S. Tsunashima, H. Sugai, Nagoya University, Japan |
| 4:00pm | PS-ThA7 Extraction of a Directional, Nearly Mono-energetic Ion Beam Using an Inductively Coupled Pulsed Plasma with an Internal Coil L. Xu, D.J. Economou, V.M. Donnelly, P. Ruchhoeft, University of Houston |
| 4:20pm | PS-ThA8 Ion Energy Selection in Expanding Thermal Plasmas by Means of Pulse-Shaped Substrate Bias M.A. Blauw, A.H.M. Smets, M. Creatore, M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands |
| 4:40pm | PS-ThA9 A Toroidal Plasma Source for Generation of High Throughput, Low Contamination Atomic Gases X. Chen, W.M. Holber, P. Loomis, J. Gunn, S.Q. Shao, MKS Instruments, Inc. |
| 5:00pm | PS-ThA10 Characterization and Modeling of a Transformer-Coupled Toroidal Plasma Source for Remote Chamber Cleaning B. Bai, J.J. An, H.H. Sawin, M. I. T. |