AVS 52nd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS-ThA

Invited Paper PS-ThA3
Characteristics of Internal Linear Inductively Coupled Plasma and Its Etching Properties for Flat Panel Display Applications

Thursday, November 3, 2005, 2:40 pm, Room 304

Session: Plasma Sources and Equipment
Presenter: G.Y. Yeom, Sungkyunkwan University, Korea
Authors: G.Y. Yeom, Sungkyunkwan University, Korea
K.N. Kim, Sungkyunkwan University, Korea
C.K. Oh, Sungkyunkwan University, Korea
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The increase of substrate size and the requirement of high rate processing for both microelectronics and flat panel display industry require large-area high density plasma sources. Among the various high density plasma sources, inductively coupled plasma sources are preferred due to its simple physics and scalability. However, conventional spiral-type external inductively coupled plasma sources can not be easily applied to the flat panel display processing due to the standing wave effect, increased capacitive coupling, etc. In this study, characteristics of an internal linear inductively plasma source was investigated as a possible high density plasma source for the application to flat panel display processing larger than 7th generation of TFT-LCD substrates. By varying the arrangements of the antenna arrays, the uniformity of the plasma has changed significantly, and, by optimizing the antenna arrangement, the plasma uniformity of 4% with the plasma density higher than 2x10@super11@ /cm@super3@ could be obtained on the substrate. Electrical characteristics of the plasma source measured by an impedance analyzer showed the low impedance and high power transfer efficiency for the optimized antenna arrangement.