AVS 52nd International Symposium
    Plasma Science and Technology Monday Sessions
       Session PS-MoM

Invited Paper PS-MoM3
Emissive Probes in Processing Plasmas - A Good Way to Measure the Plasma Potential

Monday, October 31, 2005, 9:00 am, Room 302

Session: Plasma Diagnostics
Presenter: N. Hershkowitz, University of Wisconsin
Authors: N. Hershkowitz, University of Wisconsin
D. Lee, University of Wisconsin
Correspondent: Click to Email
Electron emissive probes can provide measurements of the plasma potential with potential resolution of 0.1 V and spatial resolution of 0.1 cm in low pressure DC Argon plasma. The plasma potential is an important parameter in processing plasmas. However, such plasmas present many challenges to the use of emissive probes including rf, reactive gases, plasma deposition, impurity generation and relatively high neutral pressure so probes are rarely used. This talk provides experimental evidence that many of the challenges can be overcome and argues for increased use of emissive probes.