AVS 52nd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS+MS-ThM

Paper PS+MS-ThM10
Simplified Model for the DC Planar Magnetron Discharge

Thursday, November 3, 2005, 11:20 am, Room 302

Session: Process Equipment Modeling
Presenter: G. Buyle, Ghent University, Belgium
Authors: G. Buyle, Ghent University, Belgium
D. Depla, Ghent University, Belgium
R. De Gryse, Ghent University, Belgium
Correspondent: Click to Email
In order to investigate the DC planar magnetron discharge, we developed a simplified 2D model.@footnote 1@ This model differentiates itself from numerical models by analytically calculating the ionization caused by the high energy electrons, i.e. the electrons with energy above the ionization threshold. The model also takes into account that secondary electrons, which are emitted from the target due to ion bombardment, can be recaptured by the target.@footnote 2@ Here, the simplified model is extended such that the discharge current can be calculated. To achieve this extension, the Child-Langmuir law is applied and adapted to account for the specific magnetron discharge conditions. This way, a self-consistent model for the magnetron discharge is obtained. The extended simplified model allows investigating the influence of different external parameters on the magnetron discharge. The parameters considered are the magnetic field strength, the gas pressure, the secondary electron yield and the electron reflection coefficient. The latter two parameters are mainly determined by the target material. Special attention is given to the influence of these parameters on the current-voltage characteristic. Especially the considered target material properties seem to have a strong influence: increasing the secondary electron yield shifts the current-voltage characteristic to lower discharge voltages and increases its slope. Increasing the electron reflection coefficient leads to the same changes but their magnitude is larger. @FootnoteText@ @footnote 1@ G. Buyle et al., Vacuum 74 (3-4), 353-358, 2003.@footnote 2@ G. Buyle et al., J. Phys. D: Appl. Phys. 37, 1639-1647, 2004.