| AVS 51st International Symposium | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-MoA1 Invited Paper Dielectric Barrier, Atmospheric Pressure Glow Discharges (DB-APGD) : Applications, Diagnostics and Modeling M.R. Wertheimer, I. Radu, Ecole Polytechnique de Montreal, Canada, R. Bartnikas, Hydro Quebec Research Institute, Canada |
| 2:40pm | PS2-MoA3 Hot Hollow Cathode Diffuse Arc Deposition of Chromium Nitride Films H. Barankova, L. Bardos, L.-E. Gustavsson, Uppsala University, Sweden |
| 3:00pm | PS2-MoA4 Atmospheric Plasma Deposition of Abrasion Resistant Coatings on Plastic G. Nowling, M. Moravej, M. Yajima, R.F. Hicks, X. Yang, University of California, Los Angeles, S. Babayan, Surfx Technologies, W. Hoffman, Motorola |
| 3:20pm | PS2-MoA5 Invited Paper Plasma Surface Modification for In-line Commercial Applications A. Yializis, R.E. Ellwanger, Sigma Technologies Int'l Inc. |
| 4:00pm | PS2-MoA7 Fundamental Aspects on the Sputter Efficiency in High Power Pulsed Magnetron Sputtering U. Helmersson, J. Alami, J. Böhlmark, M. Lattemann, Linköping University, Sweden |
| 4:20pm | PS2-MoA8 RF Plasma Deposition of Thin SiO@subx@ Films onto Aluminium Alloy: XPS and Contact Angle Measurements Studies A. Azioune, M. Marcozzi, V. Revello, J.-J. Pireaux, Lise Namur, Belgium |
| 4:40pm | PS2-MoA9 Transparent Hybrid Inorganic/Organic Barrier Coatings for Plastic OLED Substrates T.W. Kim, GE Global Research Center, M. Schaepkens, GE Advanced Materials, M. Yan, A.G. Erlat, M. Pellow, P.A. McConnelee, T.P. Feist, A.R. Duggal, GE Global Research Center |
| 5:00pm | PS2-MoA10 Mass Spectrometric Determination of the Mechanism of the Chemically-Enhanced Reaction of Hydrogen Plasmas and Propellant Surfaces. R. Blumenthal, R. Valliere, Auburn University |