AVS 51st International Symposium
    Plasma Science and Technology Monday Sessions
       Session PS2-MoA

Paper PS2-MoA4
Atmospheric Plasma Deposition of Abrasion Resistant Coatings on Plastic

Monday, November 15, 2004, 3:00 pm, Room 213B

Session: Emerging Plasma Applications
Presenter: G. Nowling, University of California, Los Angeles
Authors: G. Nowling, University of California, Los Angeles
M. Moravej, University of California, Los Angeles
M. Yajima, University of California, Los Angeles
R.F. Hicks, University of California, Los Angeles
X. Yang, University of California, Los Angeles
S. Babayan, Surfx Technologies
W. Hoffman, Motorola
Correspondent: Click to Email
{The plasma-enhanced chemical vapor deposition of silicon dioxide on plastic has been examined in an atmospheric pressure discharge operating with 2.0 vol.% oxygen in helium, at 100 W RF power, and a gas temperature of ~100@degree@C. Several silicon precursors were studied, including tetramethyldisiloxane (TMDSO), tetramethyl-cyclotetrasiloxane (TMCTS), tetraethoxysilane (TEOS), hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDSN). After growth, the thickness, refractive index, composition, and structure of the films were determined by ellipsometry, infrared spectroscopy, and three-dimensional surface imaging. Hardness and abrasion tests were performed as well. Glass films could be deposited at rates up to 1.0 micron/minute using TMDSO. However, these films contained significant amounts of carbon and hydrogen, and abraded easily during scratch tests. Feeding HMDSN to the oxygen plasma resulted in the deposition of SiO@sub2@ films that were free of nitrogen and carbon, contained minimum hydroxyl concentrations, and displayed excellent hardness and scratch resistance at a film thickness >1.5 microns. The maximum deposition rate obtained using HMDSN was 0.3 microns/minute. At the meeting, we will discuss the relationship between the plasma chemistry and the properties of the glass coatings.}