AVS 51st International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS2-TuA

Invited Paper PS2-TuA1
Plasmas, Polymers and Plasma-deposited Polymer-like Films: Plasma Diagnostic Studies for SiO@sub 2@-like Film Deposition

Tuesday, November 16, 2004, 1:20 pm, Room 213B

Session: Plasma and Polymers
Presenter: M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
Authors: M. Creatore, Eindhoven University of Technology, The Netherlands
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
Correspondent: Click to Email
Low temperature plasmas for polymer modification and synthesis of polymer-like films are technologically appealing because of the development of plastic-based applications and the versatility of plasmas as processing tool in engineering the polymer-like film. As plasmas invade hot topics such as flexible electronics and nano-scale devices, the plasma- based technology urgently needs the support of fundamental studies, which can unravel the mechanisms of plasma-polymer interactions and deposition of polymer-like films. A valid example is the deposition of SiO@sub 2@ barrier layers on polymers for long-term stability devices, such as plastic windows, polyLEDs and TFTs: here the requirement of water vapor permeability is more demanding that in food packaging. This involves issues, such as the development of an interphase and the generation of defects during film growth, which go beyond the recipe for a stoichiometric, dense SiO@sub 2@ layer. Another example is the deposition of SiC@sub x@H@sub y@O@sub z@ polymer-like films as low-k dielectrics for ULSI technology. Highlighting the monomer dissociation paths is not only useful in controlling the carbon content in the film and, therefore, the quality of the dielectric, but it is also expected to pave the way towards the engineering of ultra-low-k materials. This contribution describes, through the chosen model system of SiO@sub 2@ and SiC@sub x@H@sub y@O@sub z@ film deposition, studies performed in an Ar-fed remote expanding thermal plasma where O@sub 2@ and hexamethyldisiloxane are injected downstream. The monomer dissociation paths controlled by the (Ar@super +@, e@super -@) flow emanating from the plasma source will be discussed in view of the results obtained by Cavity Ring Down Spectroscopy and Triple Stage Threshold Ionization Mass Spectrometry. Implications of these outcomes on the plasma-deposited film properties will be also addressed.