AVS 51st International Symposium
    Manufacturing Science and Technology Thursday Sessions
       Session MS-ThM

Paper MS-ThM5
Run-to-Run Process Control And Equipment Monitoring for Advanced Etch Applications.

Thursday, November 18, 2004, 9:40 am, Room 303B

Session: Advanced Process Control
Presenter: J. Yamartino, Applied Materials, Inc.
Authors: J. Yamartino, Applied Materials, Inc.
D. Mui, Applied Materials, Inc.
H. Sasano, Applied Materials, Inc.
W. Liu, Applied Materials, Inc.
M. Shen, Applied Materials, Inc.
J.P. Holland, Applied Materials, Inc.
V. Todorow, Applied Materials, Inc.
A.M. Paterson, Applied Materials, Inc.
Correspondent: Click to Email
Run-to-run process control provides a means for significantly improving the process capability index of a process tool as well reducing cycle time of product wafers. The Applied Centura Transforma Etch system provides the capability for controlling and reducing wafer-to-wafer CD variations for critical etch processes including gate etch. These capabilities includes the ability to adjust multiple process parameters based on multiple inputs from either the Fab Host or integrated CD metrology for both feedforward and feedback applications. In addition, an analysis of etch chamber data from several Applied Materials Etch systems demonstrates the importance of monitoring the chamber data for stability and excursion control. A model of the chamber behavior is created using a multivariate analysis of chamber data taken under known good production conditions. This model is then used as a baseline to which subsequent runs are compared. Excursions are detected using an overall health index and classified in terms of the chamber variable or variables responsible for the excursion. The run-to-run monitoring functionality provides a powerful means for maintaining equipment uptime and reducing wafer scrap. Finally, run-to-run monitoring of chambers which are under feedforward/feedback control enhances the capabilities of advanced process control. Examples from production data demonstrate the important link between monitoring and control.