| AVS 50th International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-WeM1 Multilayer Optical Coatings Using Closed Field Magnetron Sputtering J.M. Walls, D.G. Gibson, J. Hampshire, D.G. Teer, Applied Multilayers Ltd, UK |
| 8:40am | TF-WeM2 Smooth Optical Thin Film Formation by Oxygen Cluster Ion Beam Assisted Depositions N. Toyoda, I. Yamada, Himeji Institute of Technology, Japan |
| 9:00am | TF-WeM3 Scandium and Vanadium Multilayer Mirrors: Working Towards High Reflectivity in the Extreme Ultraviolet G. Acosta, D. Allred, R. Davis, Brigham Young University |
| 9:20am | TF-WeM4 Improvement of Reproducibility in Deposition Rate of MgF@sub 2@ Film Prepared by an rf Sputtering Technique named Keep Molecular Sputtering Method K. Kawamata, T. Deguchi, Olympus Optical Co., Ltd., Japan, E. Kusano, A. Kinbara, Kanazawa Institute of Technology, Japan |
| 9:40am | TF-WeM5 Optical Properties and Microstructure of Plasma Deposited Ta@sub 2@O@sub 5@ and Nb@sub 2@O@sub 5@ Optical Thin Films H. Szymanowski, J.-P. Masse, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique of Montreal, Canada |
| 10:00am | TF-WeM6 The Anneal Behavior of Reactively Sputtered HfN Films J. Lannon Jr., C.C. Pace, S. Goodwin, MCNC Research and Development Institute, S. Solomon, Acumen Consulting, P. Bryant, J. Oleson, Santa Barbara Infrared, Inc. |