AVS 50th International Symposium
    Thin Films Wednesday Sessions
       Session TF-WeM

Paper TF-WeM3
Scandium and Vanadium Multilayer Mirrors: Working Towards High Reflectivity in the Extreme Ultraviolet

Wednesday, November 5, 2003, 9:00 am, Room 329

Session: Optical Thin Films and Photovoltaics I
Presenter: D. Allred, Brigham Young University
Authors: G. Acosta, Brigham Young University
D. Allred, Brigham Young University
R. Davis, Brigham Young University
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Despite bulk reflectivities of materials in the EUV being typically less than 7%, it is possible to design a multilayer mirror using thin films to achieve reflectivities in the vicinity of 30-40%. Inspired by the 1998 Uspenski paper@footnote 1@ which theorized 72% reflectance of 42 nm light, we have been working on developing a design scheme that uses the rare earth metal scandium to achieve such high reflectivies. For the multilayer coating, we chose to pair scandium with vanadium to ensure distinct interfaces between the materials, since scandium and vanadium are immiscible. Our thin film samples (typically 1.5-10 nm thick) were characterized with Atomic Force Microscopy, Ellipsometry, and using an Extreme Ultraviolet Scanning Monochrometer for reflectivity measurements. In addition to preliminary EUV reflectivity predictions, optical constants were found experimentally over the 800-400nm range, as well as in the EUV. @FootnoteText@ @footnote 1@ Uspenski et al, Optics Letters, vol. 23, no. 10, 771.